Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
DHF  dilute HF; SiO2 etching solution of 49% HF in water; typical mixture: 1 part HF : 100 parts H2O.
etching, etch  subtractive process in the course of which a solid is either dissolved in liquid chemicals (wet etching) or converted into gaseous compound (dry etching); one among key processes in semiconductor manufacturing.
wet bench  typically fully automatic process tool used to carry out wet cleaning and etching operations in semiconductor processing; commonly includes several tanks each containing either cleaning/etching solution or deionized rinsing water in which wafers are immersed in predetermined sequence; typically includes also drying module.

Reference: Akrion, Inc. SemiOneSource,Notes
oxide  product (in most cases a solid) of oxygen reaction with a given element; in Si processing term typically associated with SiO2.
hydrogen termination  broken silicon bonds on the surface are saturated with hydrogen; Si-H is a stable bond preventing oxidation of silicon at room temperature.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.