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Term (Index) Definition
Cr, chrome  metal used as an opaque (nontransparent to UV)part of masks in photolithography; due to high optical density and sharp edges assures better than photoemulsion resolution of the pattern transfer process; also Cr photomasks are much more durable (scratch resistant) than emulsion masks.
photomask  mask used in photolithography to block resist exposure to UV radiation in selected areas; consists of chrome opaque areas supported by high quality quartz plate transparent to UV radiation.
photoemulsion  material acting as an opaque (nontransparent to UV radiation) part of the masks used in photolithography; inferior to chrome, used for the same purpose, due to lower optical density (thicker film needed to block off UV radiation) grainy structure (not as sharp edges as in the case of chrome) and softness making it vulnerable to mechanical damage.
opaque material  part of the mask which is not transparent to radiation used for resist exposure; different opaque materials are used in photolithography and X-ray lithography.
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