Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
Caro clean  same as SPM clean
SPM  cleaning solution; involves H2SO4:H2O2 mixture typically in 1: 4; mixing of components increases temperature of solution to over 100 oC,strongly oxidizing clean is used to remove organic materials, including remaining photoresist, from the wafer surface; typically applied first in the cleaning sequence; also know as "piranha" clean and "caro" clean.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.