Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
CVD, Chemical Vapor Deposition  Chemical Vapor Deposition is the most common thin film deposition method in advanced semiconductor manufacturing; deposited species are formed as a results of chemical reaction between gaseous reactants at elevated temperature in the vicinity of the substrate; solid product of the reaction is deposited on the surface of the substrate; used to deposit films of semiconductors (crystalline and non-crystalline), insulators as well as metals; variations of CVD processes include Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD)and Plasma Enhanced CVD (EPCVD), Metal-Organic CVD (MOCVD) and others.
Atmospheric Pressure CVD, APCVD  process of chemical vapor deposition carried out at atmospheric pressure; typically results in the inferior film quality and conformality of coating as compared to Low Pressure CVD (LPCVD).
LPCVD  Low Pressure CVD; chemical vapor deposition process carried out at reduced pressure; improves conformality of coating and purity of the films as compared to atmospheric pressure CVD (APCVD).
MOCVD  Metal-Organic Chemical Vapor Deposition; CVD process which uses metal-organic compounds as source materials; metal-organics thermally decompose at temperatures lower than other metal containing compounds; method often used in epitaxial growth of very thin films of III-V semiconductors.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.