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Term (Index) Definition
ALCVD  Atomic Layer Chemical Vapor Deposition; same as Atomic Layer Deposition (ALD).
Atomic Layer Deposition, ALD  a deposition method in which deposition of each atomic layer of material is controlled by a pre-deposited layer of precursor; precursors and various components of the film are introduced alternately; method features 100 % step coverage and very good conformality; the method is used for instance in deposition of alternative dielectrics for MOS gates.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.