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5.3. Oxide Formation by Oxidation
The native oxides of semiconductors can be effectively used in semiconductor devices. The native oxide can be formed on semiconductor surface by oxidation, i.e. through the chemical reaction between atoms from the substrate wafer and oxygen from the ambient surrounding semiconductor wafer.
Unfortunately, among semiconductors of any pratical importance only silicon (Si)forms the native oxide (SiO2)which is a device-quality insulator. Actually, this very characteristic was one among the key reasons for which silicon has become a dominant semiconductor.
This section is still under construction
References
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