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4.1. Contaminants
The most common and proven very harmful contaminants that are present in semiconductor processing environment include particles, metallic contaminants, and organic contaminants. Also, moisture from the ambient has a destabilizing effect on the condition of semiconductor surface regardless on its chemical composition. In the specific case of silicon, spontaneously grown ultra-thin layer of its native oxide SiOx is also considered to be an uncontrolled processes variable and as such is commonly removed during cleaning operations.
Suggested search words: particle control, metallic contaminants, organic contaminants.
References
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