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Sunday, March 29, 2020

#426 Thirty years ago: March 1990

Here are the themes that could be identified in some semiconductors related journal in March 1990. In the Journal of the Electrochemical Society etching appears to be one of the lead themes. Whether it was Reactive Ion Etching (RIE), or ion-milling, silicon or GaAs, etch processes were clearly at the forefront in this particular issue. It is in agreement with what I recall about those times. RIE, RIE-induced damage, and etch related surface contamination were of great interest then. 


As the name of the journal indicates, papers published in the IEEE Transactions on Electron Devices were geared more toward device-related phenomena. Exactly thirty years ago, much attention has been paid to the charge transport phenomena in both field-effect and bipolar devices, charge carrier trapping, etc. 

Posted by Jerzy Ruzyllo at 09:29 PM | Semiconductors | Link is a personal blog of Jerzy Ruzyllo. He is Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University. With over forty years' experience in academic research and teaching in semiconductor engineering he has a unique perspective on the developments in this technical domain and enjoys blogging about it.

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