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Sunday, February 7, 2016

#336 Thick films

Since in the previous blog I attempted to define a concept of the “thin”-film, a brief comment on what “thick’-films are all about is in order. A film of a solid is referred to as “thick” when its basic physical properties (e.g. resistivity of the conductor) are not significantly different from the physical properties of the same material in the bulk form. Films referred to as thick are in the thickness range typically above 100 µm.


Key difference between thin- and thick-films is in the film deposition technology. While the former use precise methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD), formation of thick-films involves techniques such as screen printing.


Thick film are not used to make semiconductor devices, and hence, are not a part of broadly understood semiconductor device technology. Thick films are commonly used to make passive elements, mainly resistors, and in general, are an important part of the hybrid IC technology.  


Posted by Jerzy Ruzyllo at 05:40 PM | Semiconductors | Link is the personal blog of Jerzy Ruzyllo. With over 35 years of experience in academic research and teaching in the area of semiconductor engineering (currently holding position of a Distinguished Professor of Electrical Engineering and Professor of Materials Science and Engineering at Penn State University), he has a unique perspective on the developments in this progress driving technical domain and enjoys blogging about it.

With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.

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