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Sunday, July 13, 2014

#296 Alternative PLD techniques

Following on comments in blog #293 let me point out that the technology of thin-film formation using liquid precursors expands rapidly in semiconductor device fabrication. It is no longer primarily photoresist deposition. Consider organic polymer semiconductors,  colloidal solutions containing nanodots, nanowires or nanotubes, low-k interlayer dielectrics, etc.


Responding to those emerging needs the arsenal of physical layer deposition techniques also grows well beyond the best established spin-on deposition. Printing, including ink-jet-like printing and nanoprinting, micro-spray and mist deposition (see next blog for more on this one) are finding their way into semiconductor manufacturing where a rigid, circular wafer is no longer the only type of the substrate (think very large area substrates, flexible sheets and ribbons substrates, roll-to-roll processing, etc.)


Posted by Jerzy Ruzyllo at 01:17 PM | Semiconductors | Link is the personal blog of Jerzy Ruzyllo. With over 35 years of experience in academic research and teaching in the area of semiconductor engineering (currently holding position of a Distinguished Professor of Electrical Engineering and Professor of Materials Science and Engineering at Penn State University), he has a unique perspective on the developments in this progress driving technical domain and enjoys blogging about it.

With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.

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