back to S1S home

Sunday, June 15, 2014

#292 Physical Liquid Deposition, PLD (think... painting!)

Thin film technology is a foundation of semiconductor manufacturing. In the process of thin film formation the source material (starting material) can be a gas (typical situation in the most of the Chemical Vapor Deposition or CVD processes), a solid (common in Physical Deposition Processes or PVD) or a liquid in which case the term Physical Liquid Deposition, or PLD, seems to adequately describe the nature of the process.

 

At the first glance the concept of Physical Liquid Deposition may not be all that obvious. In the case you don’t immediately see what PLD is all about think…. painting!

 

More on PLD next time

Posted by Jerzy Ruzyllo at 12:54 PM | Semiconductors | Link



Semi1source.com/blog is the personal blog of Jerzy Ruzyllo. With over 35 years of experience in academic research and teaching in the area of semiconductor engineering (currently holding position of a Distinguished Professor of Electrical Engineering and Professor of Materials Science and Engineering at Penn State University), he has a unique perspective on the developments in this progress driving technical domain and enjoys blogging about it.



With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.






‹‹ February 2018 ››
W Mo Tu We Th Fr Sa Su
5 1 2 3 4
6 5 6 7 8 9 10 11
7 12 13 14 15 16 17 18
8 19 20 21 22 23 24 25
9 26 27 28        


Copyright © 2018 J. Ruzyllo. All rights reserved.