Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
supercritical cleaning  surface cleaning technique which uses supercritical fluid as a cleaning agent.

Reference: SemiOneSource,Notes
supercritical fluid  state of matter into which gases and liquids are converted at elevated temperature and high pressure; supercritical fluid has characteristic of both liquid and a gas; it lacks any surface tension while interacting with solid surfaces, and hence, can readily penetrates high aspect ratio geometrical features; it has very low viscosity and, like a liquid, easily dissolves large quantities of other chemicals; in semiconductor processing used in surface cleaning when penetration of very tight geometrical features is required; typically supercritical CO2 is used as carrier of cleaning agents.
supercritical CO2 , SCCO2  gas of choice for supercritical fluid applications; critical point (transition from gas to supercritical fluid)at 31 oC and 73 atm.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.