Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
post-CMOS  term refers to the new generation of devices that will perform digital functions after further scaling of CMOS won't be possible due to insurmountable physical barriers; e.g. EOT of gate oxide will have to be reduced to zero.

Reference: See what after CMOS?
CMOS  Complementary Metal Oxide Semiconductor structure; consists of N-channel and P-channel MOS transistors; due to very low power consumption and dissipation as well minimization of the current in "off" state CMOS is a very effective device configuration for implementation of digital functions; CMOS is a key device in state-of-the-art silicon microelectronics.
EOT, equivalent oxide thickness  a number used to compare performance of high-k dielectric MOS gates with performance of SiO2 based MOS gates; shows thickness of SiO2 gate oxide needed to obtain the same gate capacitance as the one obtained with thicker than SiO2 dielectric featuring higher dielectric constant k; e.g. EOT of 1 nm would result from the use a 10 nm thick dielectric featuring k=39 (k of SiO2 is 3.9)
scaling rules  design rules which must be followed while scaling down geometry of integrated devices and interconnect lines; arbitrary reduction of key geometries, e.g. channel length in MOSFETs, may results in dysfunctional devices, e.g. short-channel effects in MOSFET.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.