Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
SRD  Spin Rinse-Dry
deionized water, DI water  ultra-pure water used in semiconductor manufacturing; produced by removing all ions of dissolved minerals using reverse osmosis and ion-exchange systems; DI water should also be free from particles, bacteria, organics, and dissolved oxygen; purity of deionized water is determined based on its resistivity; target resistivity is 18 megaohm-cm.
spin cleaning  so-called "dynamic cleaning"; wafer rotated at high rpm's is subjected to interactions with cleaning solutions and DI water; single wafer process.

Reference: See Semiconductor Notes for more information
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.