Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
IPA drying  wafer drying technique using isopropyl alcohol (IPA); wet wafer is exposed to the hot vapor of IPA which displaces water from the wafer surface; IPA evaporates during wafer cooling leaving surface moisture-free.
Marangoni drying  wafer drying technique; wafer is gradually withdrawn from water into the vapor of isopropyl alcohol (IPA) and nitrogen; due to the gradient of surface tension water from the surface of the wafer is pulled back into the body of water leaving emerging surface free of any moisture.
spin drying  removal of water from the surface of the wafer by centrifugal forces during fast spinning of the wafer.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.